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vacuum smelting process HIP Zinc Sulfide alloy sputtering target
NiV 97:3wt% Nickel vanadium alloy sputtering target
magnetron sputtering coating target ALT2017019C
Competitive price and fast delivery high purity 99.999% poly Si target
TiAl target ALT2017016TIAL
high purity99.9%~99.95% Cobalt alloy magnetron sputtering coating target
high purity 99.999% Silicon magnetron sputtering coating target
30:70at% Aluminium Chromium alloy magnetron sputtering coating target
Optical communication industry Titanium Oxide sputtering target
Customized by drawing Si rotary metal sputtering target
uniform grain size high purity 99.8%~99.99% arc titanium target
high purity 99.999% Silicon oxide sputtering target
L4000mm*W400mm*T40mm with hole or step Si+Cu bonding metal sputtering target
The flat panel Display coating industry brass target copper sputtering target
Vacuum smelting process&HIP sputtering target SiO2 Bonding target
Vacuum melting process HIP sputtering arc chromium target
Solar PV and Heating industry 99.999% sputtering target Aluminium target
Uniform grain size surface magnetron sputtering coating target
good compactness>99% (no porasity) 8020wt% nickel chromium sputtering target
high purity Cr+Cu bonding chromium target
304 SS/316L stainless steel magnetron sputtering coating target
NbOx target magnetron sputtering coating target
10WT% ITO glass Indium tin oxide magnetron sputtering coating target
high purty HIP rolled pure chromium sputtering target for coating film
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